Scalability of Magnetic Tunnel Junctions Patterned by a Novel Plasma Ribbon Beam Etching Process on 300 mm Wafers

@article{Xue2015ScalabilityOM,
  title={Scalability of Magnetic Tunnel Junctions Patterned by a Novel Plasma Ribbon Beam Etching Process on 300 mm Wafers},
  author={Lin Xue and Alex Kontos and Christopher Lazik and Shurong Liang and Mahendra Pakala},
  journal={IEEE Transactions on Magnetics},
  year={2015},
  volume={51},
  pages={1-3}
}
The performance of magnetic tunnel junction (MTJ) over its critical dimension (CD) is critical to the application of spin transfer torque magnetic random access memory. To study the CD scaling effects, we designed a series of MTJ CDs and used a novel plasma ribbon beam etching (PRBE) process to pattern the MTJs. PRBE has constant beam density and beam angle distribution across a 300 mm wafer. The MTJs patterned by PRBE demonstrated low tunneling magnetoresistance degradation from 145% on… CONTINUE READING
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