STM observations of hafnium carbide thin films as a field emission material

We examine microscopic behaviors of work function and topography with scanning tunneling microscopy (STM). Hafnium carbide thin films were deposited on an n-type Si flat substrate by inductively coupled plasma (ICP) assisted magnetron sputtering at the argon pressure of 0.1 Pa. The surface of the films was cleaned by in-situ argon ion sputtering before STM… CONTINUE READING