SEM-based nanoprobing on 32 and 28 nm CMOS devices challenges for semiconductor failure analysis

@article{Paul2014SEMbasedNO,
  title={SEM-based nanoprobing on 32 and 28 nm CMOS devices challenges for semiconductor failure analysis},
  author={Erik Paul and Holger Herzog and S{\"o}ren Jansen and Christian Hobert and Eckhard Langer},
  journal={Microelectronics Reliability},
  year={2014},
  volume={54},
  pages={2115-2117}
}
This paper presents an effective device-level failure analysis (FA) method which uses a high-resolution low-kV Scanning Electron Microscope (SEM) in combination with an integrated state-of-the-art nanomanipulator to locate and characterize single defects in failing CMOS devices. The presented case studies utilize several FA-techniques in combination with SEM-based nanoprobing for nanometer node technologies and demonstrate how these methods are used to investigate the root cause of IC device… CONTINUE READING

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