SEED LAYER DEPENDENCE OF ROOM-TEMPERATURE RECRYSTALLIZATION IN ELECTROPLATED COPPER FILMS

@inproceedings{Ueno1999SEEDLD,
  title={SEED LAYER DEPENDENCE OF ROOM-TEMPERATURE RECRYSTALLIZATION IN ELECTROPLATED COPPER FILMS},
  author={Kazuyoshi Ueno and Tom Ritzdorf and Scott A. Grace},
  year={1999}
}
Room-temperature recrystallization (self-annealing) of electroplated copper (Cu) films is investigated using three kinds of seed/barrier layers with nontexture and (111) texture. The as-plated films have almost the same texture as the seeds. The texture changes during self-annealing depend on the seed texture. The (111) texture of the self-annealing films increases for the film deposited on the nontexture seed layer, but decreases for the film deposited on (111) texture seed layers. For all the… CONTINUE READING