Run to Run Controller resulting in stable critical dimensions during plasma etch

  • Mauerer Alexander
  • Published 2017 in
    2017 40th International Convention on Information…

Abstract

The topic of this manuscript is the development and usage of a Run to Run Controller for etching systems. The system uses dynamic status values and can be operated in different modes. This allows manufacturing high accuracy critical dimensions for contacts or vias. 

Topics

8 Figures and Tables