Role of CDAFM in achieving accurate OPC modeling

@inproceedings{Ukraintsev2009RoleOC,
  title={Role of CDAFM in achieving accurate OPC modeling},
  author={Vladimir Ukraintsev},
  booktitle={Advanced Lithography},
  year={2009}
}
ABSTRACT Accuracy of patterning strongly impacts profit of IC manufacturing and depends on accuracy of optical proximity correction (OPC) and resolution enhan cement technology (RET) models. Despite its importance accuracy of RET and OPC is not known in most cases. Accuracy of CDSEM which is used to build the models is questionable. Sample-to-sample bias variation of CDSEM is exceeding required su b-nanometer uncertainty budget . CDAFM could be used for reference and bias correction. Use of AFM… CONTINUE READING

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