Robust shadow-mask evaporation via lithographically controlled undercut

@inproceedings{Cord2006RobustSE,
  title={Robust shadow-mask evaporation via lithographically controlled undercut},
  author={Bryan M. Cord and Chris Dames and Karl K Berggren},
  year={2006}
}
Suspended shadow-mask evaporation is a simple, robust technique for fabricating Josephson-junction structures using scanning electron-beam lithography. The basic process entails the fabrication of an undercut structure in a resist bilayer to form a suspended “bridge,” followed by two angle evaporations of superconducting material with a brief oxidation step in between. The result is two overlapping wires separated by a thin layer of oxide. Josephson junctions with sub50-nm diameters are of… CONTINUE READING