Robust Mask Design with Defocus Variation Using Inverse Synthesis

  • Ningning Jiaa, Alfred K. Wongb, Edmund Y. Lama
  • Published 2008

Abstract

The continuous integrated circuit miniaturization and the shrinkage of critical dimension (CD) have pushed the development of optical proximity correction (OPC), and also making CD more sensitive to process variations. Traditional OPC optimizes mask patterns at nominal lithography conditions, which may lead to poor performance with process variations. Hence… (More)

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