Reticle enhancement technology trends: resource and manufacturability implications for the implementation of physical designs

Abstract

In this paper, we briefly describe the lithography developments known as RET (Resolution Enhancement Technologies),which include off-axis illumination in litho tools,Optical and Process Correction (OPC), and phase shifting masks (PSM). All of these techniques are adopted to allow ever smaller features to be reliably manufactured, and are being generally… (More)
DOI: 10.1145/369691.369730

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Cite this paper

@inproceedings{Grobman2001ReticleET, title={Reticle enhancement technology trends: resource and manufacturability implications for the implementation of physical designs}, author={Warren Grobman and Robert Boone and Cece Philbin and Bob Jarvis}, booktitle={ISPD}, year={2001} }