Resist Science and Kinetics

@article{Tagawa2007ResistSA,
  title={Resist Science and Kinetics},
  author={Seiichi Tagawa},
  journal={2007 Digest of papers Microprocesses and Nanotechnology},
  year={2007},
  pages={8-8}
}
Significant advances are continually being made in semiconductor device fabrication, especially in lithography. A key step in the lithography involves the definition of a circuit pattern into a resist. The economical operation of semiconductor device fabrication demands extremely high resist sensitivity. For the achievement of high sensitivity, the concept of chemical amplification is an indispensable technology. Nowadays the trade-off between sensitivity, resolution, and line edge roughness is… CONTINUE READING