Removal of SU-8 photoresist for thick film applications *

@inproceedings{Dentinger2002RemovalOS,
  title={Removal of SU-8 photoresist for thick film applications *},
  author={Paul M. Dentinger and W. Miles Clift and S. Goods},
  year={2002}
}
SU-8 photoresist has consistently shown excellent resolution in thick film applications, has been utilized as an electroplating mold, and is sensitive to inexpensive UV sources. However, the highly crosslinked epoxy remaining after development is difficult to remove reliably from high aspect ratio structures without damage or alteration to the electroplated metal. A review of physical and chemical removal options is discussed with data on the most promising options shown. Several standard… CONTINUE READING
Highly Cited
This paper has 33 citations. REVIEW CITATIONS

Citations

Publications citing this paper.
Showing 1-10 of 24 extracted citations

Advanced microfabrication techniques for the development of millimeter-wave wafer-level waveguide devices

2017 International Applied Computational Electromagnetics Society Symposium (ACES) • 2017
View 1 Excerpt

References

Publications referenced by this paper.
Showing 1-8 of 8 references

High aspect ratio patterning with a proximity UV source, Microelectron

P. M. Dentinger, K. L. Krafcik, K. L. Simison
2001
View 2 Excerpts

LaBianca et al., Negative photoresists for optical lithography

J. M. Shaw, N.C.J.D. Gelorme
IBM J. Res. Dev • 1997
View 2 Excerpts

P

B. Balazs, Z. Chiba
Hsu et al., Destruction of hazardous and mixed wastes using mediated electrochemical oxidation in a Ag(II) /HNO bench scale system, in: Presented at the 6th Proceedings of the International Conference on 3 Radioactive Waste Management and Environmental Remediation • 1997

Light-directed synthesis of high-density oligonucleotide arrays using semiconductor photoresists.

Proceedings of the National Academy of Sciences of the United States of America • 1996
View 1 Excerpt

US patent

J. D. Gelorme, R. J. Cox, S.A.R. Gutierrez
November 21 • 1989
View 1 Excerpt

Semiconductor Lithography

W. M. Moreau
Plenum Press, New York • 1988
View 1 Excerpt

Corrosion

A. Rahmel
in: D.G. Lovering (Ed.), Molten Salt Technology, Plenum Press, London • 1982
View 2 Excerpts

Similar Papers

Loading similar papers…