Relaxation behavior of polymer structures fabricated by nanoimprint lithography.


We study the decay of imprinted polystyrene (PS) patterns under thermal annealing using light diffraction. The first-order diffraction intensity from the imprinted gratings was measured as a function of annealing time. A local intensity maximum is observed as a function of annealing time. This "abnormal" intensity variation can be qualitatively understood… (More)
DOI: 10.1021/nn700014p


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