Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon

@article{Wagenpfeil2021ReflectivityOV,
  title={Reflectivity of VUV-sensitive silicon photomultipliers in liquid Xenon},
  author={Michael Wagenpfeil and T. Ziegler and Judith Schneider and Alexander Fieguth and Michael Murra and Daniel Schulte and L. Althueser and Christian Huhmann and Christian Weinheimer and Thilo Michel and Gisela Anton and Govinda Adhikari and S. Al Kharusi and Evan Angelico and Isaac J. Arnquist and I. Badhrees and Jason Bane and D. Beck and V. Belov and T. Bhatta and A. Bolotnikov and Pieter A Breur and Jason Brodsky and Ethan Brown and T. Brunner and Erica Caden and Gaolong Cao and Christopher Chambers and B. Chana and Serge A. Charlebois and Dmitry Chernyak and M. Chiu and Bruce T. Cleveland and Adam Craycraft and Timothy V. Daniels and Louise Darroch and A. Der Mesrobian-Kabakian and A. De St. Croix and Keven Deslandes and Ralph G. DeVoe and Maria Laura di Vacri and M J Dolinski and Jonathan Echevers and M. Elbeltagi and Lorenzo Fabris and David Fairbank and William M. Fairbank and Jacques Farine and Simone Ferrara and Soheyla Feyzbakhsh and G. Gallina and P. Gautam and Gabriele Giacomini and Charlotte Gingras and Damian Goeldi and Abby H. Gorham and Razvan Gornea and Giorgio Gratta and Erin V. Hansen and C. A. Hardy and Khadouja Harouaka and Michael Heffner and Eric W. Hoppe and Allan House and Michael Hughes and A. Iverson and A. Jamil and M. J. Jewell and A. K. Karelin and Lisa J. Kaufman and R. Kr{\"u}cken and A. V. Kuchenkov and K.S. Kumar and Yang Lan and A. Larson and K. G. Leach and Douglas S. Leonard and G. S. Li and S. Li and Z. Li and Caio Licciardi and R. Lindsay and Ryan Maclellan and P. Martel-Dion and Nicolas Massacret and Thomas McElroy and M. Medina Peregrina and Brian Mong and David C. Moore and K. Murray and Jason Nattress and C R Natzke and Robert Jason Newby and Fr{\'e}d{\'e}ric Nolet and O. Nusair and J. C. Nzobadila Ondze and Kelly Odgers and Allen C. Odian and J. L. Orrell and G. S. Ortega and I. Ostrovskiy and Cory T. Overman and Samuel Parent and Andreas Piepke and Andrea Pocar and Jean-François Pratte and E. Raguzin and G J Ramonnye and H. Rasiwala and Sergio Rescia and Fabrice Reti{\`e}re and C Richard and Michael Richman and Jon Ringuette and A. L. Robinson and Tommy Rossignol and Peter C. Rowson and Nicolas Roy and R. Saldanha and Samuele Sangiorgio and Arun Kumar Soma and Francesco Spadoni and V. N. Stekhanov and T. Stiegler and M Tarka and Seth P. Thibado and A. Tidball and J. Todd and T. I. Totev and S. Triambak and R. H. M. Tsang and Fr{\'e}d{\'e}ric Vachon and Venkatesh Veeraraghavan and S Viel and Carlos Vivo-Vilches and M. Walent and Ubi F. Wichoski and M. Worcester and S.X. Wu and Q. Xia and W. C. Yan and L. Yang and O. Ya. Zeldovich},
  journal={Journal of Instrumentation},
  year={2021},
  volume={16}
}
Silicon photomultipliers are regarded as a very promising technology for next-generation, cutting-edge detectors for low-background experiments in particle physics. This work presents systematic reflectivity studies of Silicon Photomultipliers (SiPM) and other samples in liquid xenon at vacuum ultraviolet (VUV) wavelengths. A dedicated setup at the University of Münster has been used that allows to acquire angle-resolved reflection measurements of various samples immersed in liquid xenon with 0… 

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