Recent progress in high resolution lithography

@article{Bratton2006RecentPI,
  title={Recent progress in high resolution lithography},
  author={D. Bratton and Da Yang and Junyan Dai and C. Ober},
  journal={Polymers for Advanced Technologies},
  year={2006},
  volume={17},
  pages={94-103}
}
The nanotechnology revolution of the past decade owes much to the science of lithography, an umbrella term which encompasses everything from conventional photolithography to “unconventional” soft lithography and the self-assembly of block polymers. In this review, some of the recent advances in lithography are summarized with special reference to the microelectronics industry. The next generation photolithography, two-photon lithography, step-and-flash imprint lithography and nanofabrication… Expand

Figures from this paper

Nanosphere lithography: a powerful method for the controlled manufacturing of nanomaterials
The never-ending race towards miniaturization of devices induced an intense research in the manufacturing processes of the components of those devices. However, the complexity of the process combinedExpand
Unconventional methods for forming nanopatterns
Nanostructured materials have become an increasingly important theme in research, in no small part due to the potential impacts this science holds for applications in technology, including suchExpand
Soft Lithographic Approaches to Nanofabrication
This chapter reviews soft lithographic approaches to nanofabrication: that is, the generation and replication of patterns using a polymeric stamp bearing relief features. Soft lithographic methodsExpand
And There Was Light: Prospects for the Creation of Micro- and Nanostructures through Maskless Photolithography.
  • J. Rühe
  • Materials Science, Medicine
  • ACS nano
  • 2017
TLDR
The prospects of maskless photolithography technologies with a focus on two-photon lithography and scanning-probe-based photochemical processes based on scanning near-field optical microscopy or beam pen lithography are discussed. Expand
Directional photofluidization lithography: micro/nanostructural evolution by photofluidic motions of azobenzene materials.
TLDR
Direction photofluidization lithography (DPL) makes it possible to fabricate a generic and sophisticated micro/nanoarchitecture that would be difficult or impossible to attain with other methods, and could provide compelling opportunities for basic micro/nanoscale science and general technology applications. Expand
Meniscus-mask lithography for fabrication of narrow nanowires.
TLDR
High reproducibility of the MML method is shown, and crossbar structures produced by MML demonstrate that junctions of nanowires could be fabricated as well, providing the building blocks required for fabrication of Nanowire structures of varied planar geometry. Expand
Molecular-ruler nanolithography
Molecular-ruler nanolithography uses individual molecules as building blocks to create nanometer-scale features in a low-cost, high-throughput process. Self-assembled multilayers are used inExpand
Continuous and high-throughput nanopatterning methodologies based on mechanical deformation
This feature article provides an overview of several mechanical-based micro- and nanopatterning technologies that can achieve continuous and high-throughput fabrication of various sub-wavelengthExpand
Photochemistry in Electronics
Photochemistry plays a critical role in modern semiconductor electronics, primarily through the use of photoactive polymers or photoresists in the lithographic processes used to fabricateExpand
Maskless lithography of silazanes for fabrication of ceramic micro-components
Abstract Free standing single layer silicon carbonitride components with sub-mm features have been constructed by maskless lithography followed by pyrolysis. In comparison to prior fabricationExpand
...
1
2
3
4
5
...

References

SHOWING 1-10 OF 106 REFERENCES
3D Patterning by means of nanoimprinting, X-ray and two-photon lithography
Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolution are presented and discussed. The first one is based on the combined use of nanoimprint andExpand
Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology
The goal of the SFIL development program is to enable patterning of sub-100 nm features at room temperature and with minimal applied pressure. We believe the use of low viscosity materials andExpand
EUV interferometric lithography for resist characterization
We report printing of sub-20nm line/space patterns by Interferometric Lithography technique with EUV light for the first time. EUV lithography is pursued as one of the candidate next generationExpand
Synthesis and evaluation of novel organoelement resists for EUV lithography
EUV lithography is to date the most promising NGL technology for the sub-50nm technology node. In this work, we have designed and synthesized several types of organoelement resists with minimumExpand
Nanomolecular resists with adamantane core for 193-nm lithography
To satisfy the upcoming demand of next generation lithography, new chemically amplified resist materials should be developed that can perform at the limit where the image feature size is on the orderExpand
Fabrication of nanostructures with long-range order using block copolymer lithography
Block copolymer lithography makes use of the self-assembling properties of block copolymers to pattern nanoscale features over large areas. Although the resulting patterns have good short-rangeExpand
Step and flash imprint lithography for sub-100-nm patterning
Step and Flash Imprint Lithography (SFIL) is an alternative to photolithography that efficiently generates high aspect-ratio, sub-micron patterns in resist materials. Other imprint lithographyExpand
Imprint lithography for integrated circuit fabrication
TLDR
The escalating cost for next generation lithography (NGL) tools is driven in part by the need for complex sources and optics, and several researchers are looking at low cost alternative methods for printing sub-100 nm features. Expand
UNCONVENTIONAL NANOFABRICATION
Nanostructures are fabricated using either conventional or unconventional tools—that is, by techniques that are highly developed and widely used or by techniques that are relatively new and stillExpand
Imprint lithography: lab curiosity or the real NGL
The escalating cost for Next Generation Lithography (NGL) tools is driven in part by the need for complex sources and optics. The cost for a single NGL tool could exceed $50M in the next few years, aExpand
...
1
2
3
4
5
...