Real-time , in sifu monitoring of surface reactions during plasma passivation of GaAs

@inproceedings{Aydil1999RealtimeI,
  title={Real-time , in sifu monitoring of surface reactions during plasma passivation of GaAs},
  author={Eray S Aydil and Zhen Zhou and Konstantinos P Giapis and Yves J Chabal and Jeffrey A. Gregus and Richard A. Gottscho},
  year={1999}
}
Real-time, in situ observations of surface chemistry during the remote plasma passivation of GaAs is reported herein. Using attenuated total reflection Fourier transform infrared spectroscopy, the relative concentrations of -As-O, -As-H, -H,O, and -CHz bonds are measured as a function of exposure to the effluent from a microwave discharge through NH,, NDs… CONTINUE READING