# Reactor scale simulations of ALD and ALE: ideal and non-ideal self-limited processes in a cylindrical and a 300 mm wafer cross-flow reactor

@inproceedings{YanguasGil2021ReactorSS, title={Reactor scale simulations of ALD and ALE: ideal and non-ideal self-limited processes in a cylindrical and a 300 mm wafer cross-flow reactor}, author={Angel Yanguas-Gil and Joseph A. Libera and Jeffrey W. Elam}, year={2021} }

We have developed a simulation tool to model self-limited processes such as atomic layer deposition and atomic layer etching inside reactors of arbitrary geometry. In this work, we have applied this model to two standard types of cross-flow reactors: a cylindrical reactor and a model 300 mm wafer reactor, and explored both ideal and non-ideal self-limited kinetics. For the cylindrical tube reactor the full simulation results agree well with analytic expressions obtained using a simple plug flow… Expand

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