Reactive sputtering of titanium in Ar/CH4 gas mixture: Target poisoning and film characteristics

@inproceedings{Fouad2009ReactiveSO,
  title={Reactive sputtering of titanium in Ar/CH4 gas mixture: Target poisoning and film characteristics},
  author={Osama A. Fouad and Abdul K. Rumaiz and Syed Ismat Ullah Shah},
  year={2009}
}
Reactive sputtering of titanium target in the presence of Ar/CH{sub 4} gas mixture has been investigated. With the addition of methane gas to above 1.5% of the process gas a transition from the metallic sputtering mode to the poison mode was observed as indicated by the change in cathode current. As the methane gas flow concentration increased up to 10%, the target was gradually poisoned. The hysteresis in the cathode current could be plotted by first increasing and then subsequently decreasing… CONTINUE READING