Rapid fabrication of large-area periodic structures containing well-defined defects by combining holography and mask techniques.

Abstract

We demonstrate a promising method to fabricate large-area periodic structures with desired defects by using the combination of multiple-exposure two-beam interference and mask-photolithography techniques. Multiple-exposure of two-beam interference pattern at 325 nm into a positive AZ-4620 (or a negative SU-8) photopolymerizable photoresist is used to form a… (More)

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