Rapid Surface Oxidation of the Si Substrate Using Longitudinally Long Ar/O2 Loop Type of Inductively Coupled Thermal Plasmas

@article{Maruyama2016RapidSO,
  title={Rapid Surface Oxidation of the Si Substrate Using Longitudinally Long Ar/O2 Loop Type of Inductively Coupled Thermal Plasmas},
  author={Yuji Maruyama and Yasunori Tanaka and Hiromitsu Irie and Takumi Tsuchiya and Mai Kai Suan Tial and Yoshihiko Uesugi and Tatsuo Ishijima and Tetsuya Yukimoto and Hiroshi Kawaura},
  journal={IEEE Transactions on Plasma Science},
  year={2016},
  volume={44},
  pages={3164-3171}
}
This paper describes the application of a loop type of inductively coupled thermal plasmas (loop-ICTPs) to high-speed oxidation processing. We earlier developed a unique loop-ICTP for large-area thermal plasma materials processing. In this application of the loop-ICTP for oxidation, a part of the Ar/O2 loop-ICTP was formed directly lying in the longitudinal… CONTINUE READING