Rapid Ordering in "Wet Brush" Block Copolymer/Homopolymer Ternary Blends.

Abstract

The ubiquitous presence of thermodynamically unfavored but kinetically trapped topological defects in nanopatterns formed via self-assembly of block copolymer thin films may prevent their use for many envisioned applications. Here, we demonstrate that lamellae patterns formed by symmetric polystyrene-block-poly(methyl methacrylate) diblock copolymers self… (More)
DOI: 10.1021/acsnano.7b06154

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