• Corpus ID: 17505576

RECENT ADVANCES AND TRENDS IN NUMERICAL TECHNIQUES FOR PROCESS SIMULATIONf

@inproceedings{Joppich2003RECENTAA,
  title={RECENT ADVANCES AND TRENDS IN NUMERICAL TECHNIQUES FOR PROCESS SIMULATIONf},
  author={Wolfgang Joppich},
  year={2003}
}
-The gradually increasing complexity of the processing models and necessity to simulate in higher dimensions persistently challenges computational efficiency of the modern process simulators. In this paper, an outlook on the current status and trends in numerical techniques for efficient multidimensional bulk process simulation is given. Grid generation, grid adaptation, discretization and solving techniques are considered as the principle numerical building blocks of modem process simulation… 

Figures from this paper

References

SHOWING 1-10 OF 36 REFERENCES
A general numerical procedure for multilayer multistep IC process simulation
TLDR
Capabilities of the methodology, including geometric flexibility, efficiency in grid distribution, accuracy in treating the moving boundaries, and facility for modification of the physical model are discussed.
Automatic grid refinement and higher order flux discretization for diffusion modeling
TLDR
The authors point out that modern numerical process simulators are becoming increasingly complicated in both physical models and domain shape, and adaptive grid refinement is considered for use in solving diffusion problems.
Adaptive mesh refinement for multilayer process simulation using the finite element method
An adaptive mesh refinement technique is proposed for a two-dimensional finite-element multilayer process simulator. Mesh refinement is based on the dopant concentration ratio inside each element,
SMART-P: rigorous three-dimensional process simulator on a supercomputer
TLDR
A description is given of a three-dimensional process simulator that is based on the finite-difference approach to the supercomputer FACOM VP-100 that has been demonstrated in applications relating to both local oxidation of silicon and trench-isolated 0.5 mu m MOSFET structures.
Music - a multigrid simulator for IC fabrication processes
This paper describes a new two‐dimensional process simulation program MUSIC (MUltigrid Simulator for IC fabrication processes) which is prospective for the efficient IC process simulations due to its
Exponentially fitted discretization schemes for diffusion process simulation on coarse grids
  • S. Mijalkovic
  • Mathematics
    IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
  • 1996
TLDR
This paper examines formulation of the discretization schemes for diffusion process simulation that allow coarse grid spacings in the areas of exponentially varying concentrations and fluxes and shows clear superiority of the exponentially fitted schemes over the standard approaches as well as robustness of a new finite element scheme regarding irregular grid geometry.
Grid and Geometry Techniques for Multi-Layer Process Simulation
A robust grid generation and evolution technique for process simulation is presented. A quadtree approach is used to decimate the geometry and final triangulation is performed using templates.
A comprehensive two-dimensional VLSI process simulation program, BICEPS
  • B. Penumalli
  • Physics
    IEEE Transactions on Electron Devices
  • 1983
Bell Integrated Circuit Engineering Process Simulator (BICEPS) is a comprehensive VLSI process-simulation program developed at Bell Laboratories. BICEPS incorporates the most up-to-date physical
A discretization scheme that allows coarse grid-spacing in finite-difference process simulation
  • R. Lowther
  • Engineering
    IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.
  • 1989
TLDR
The central processing unit requirements of two-dimensional numerical process simulation require much larger typical grid spacings than those used in one-dimensional simulations, and the standard method for diffusion simulation overestimates the amount of diffusion.
...
...