Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks.

@article{Girardot2014PulsedTE,
  title={Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks.},
  author={C. Girardot and S. Böhme and S. Archambault and M. Sala{\"u}n and E. Latu-Romain and G. Cunge and O. Joubert and M. Zelsmann},
  journal={ACS applied materials \& interfaces},
  year={2014},
  volume={6 18},
  pages={
          16276-82
        }
}
This work presents the graphoepitaxy of high-χ block copolymers (BCP) in standard industry-like lithography stacks and their transfer into the silicon substrate The process includes conventional 193 nm photolithography, directed self-assembly of polystyrene-block-polydimethylsiloxane (PS-b-PDMS) and pulsed plasma etching to transfer the obtained features into the substrate. PS-b-PDMS has a high Flory-Huggins interaction parameter (high-χ) and is capable of achieving sub-10 nm feature sizes. The… Expand
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References

SHOWING 1-10 OF 32 REFERENCES
Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design
The control of order and orientation of the self-assembly of cylinder-forming poly(styrene-b-dimethylsiloxane) block copolymer is demonstrated. Copolymer thin films are spun-cast onto topographicallyExpand
Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer.
TLDR
This block copolymer system has excellent characteristics for self-assembled nanolithography applications and the high Si content in PDMS leaves a robust oxide etch mask after two-step reactive ion etching. Expand
A path to ultranarrow patterns using self-assembled lithography.
The templated self-assembly of block copolymer (BCP) thin films can generate regular arrays of 10-50 nm scale features with good positional and orientational accuracy, but the ordering, registrationExpand
Silicon oxy carbide nanorings from polystyrene-b-polydimethylsiloxane diblock copolymer thin films
A silicon-containing diblock copolymer, poly(styrene)-b-poly(dimethylsiloxane) (PS-PDMS), with PDMS cylinders in a PS matrix has been synthesized through sequential anionic polymerization. PS-PDMSExpand
Achieving structural control with thin polystyrene- b-polydimethylsiloxane block copolymer films: The complex relationship of interface chemistry, annealing methodology and process conditions
Abstract The structure of thin microphase-separated polystyrene- block -polydimethylsiloxane (PS–PDMS) films has been studied using state-of-the-art top-down and cross-sectional electron microscopy.Expand
Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns
2009 WILEY-VCH Verlag Gmb Well-controlled monolayer patterns of microdomains of block copolymers (BCPs) have been widely pursued for applications in sub-30-nm nanolithography. BCP film processing isExpand
Nanotransfer printing with sub-10 nm resolution realized using directed self-assembly.
An extraordinarily facile sub-10 nm fabrication method using the synergic combination of nanotransfer printing and the directed self-assembly of block copolymers is introduced. The approach isExpand
Ordered block-copolymer assembly using nanoimprint lithography
Nanoimprint lithography and self-assembly of poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer are combined to induce order in the phase-separated domains. Tailored periodicExpand
Dry etching of polydimethylsiloxane for microfluidic systems
A fluorine-based reactive ion etch (RIE) process has been developed to anisotropically dry etch the silicone elastomer polydimethylsiloxane (PDMS). This technique complements the standard moldingExpand
Directed self-assembly with sub-100 degrees Celsius processing temperature, sub-10 nanometer resolution, and sub-1 minute assembly time.
TLDR
DSA of block copolymers (BCPs) has recently attracted much attention as a promising candidate for nextgeneration lithography due to its capacity to provide excellent resolution and scalability. Expand
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