Pulsed laser deposition chamber for in situ X-ray diffraction.


A sample chamber has been constructed for studying the growth of thin films by pulsed laser deposition in situ with surface X-ray diffraction. The achievable temperature ranges from room temperature to 1073 K in a controlled oxygen environment. The partial pressure of the oxygen background gas covers the range from 0.1 to 10(5) Pa. The first results… (More)


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