Proximity effect in electron beam lithography


Proximity effect is the most severe factor that influences the exposure resolution of electron beam. In this paper, the mechanism of proximity effect is discussed through Monte Carlo simulation of the electron scattering processes. And effective approaches of proximity effect correction are proposed. The theoretical results of Monte Carlo simulation and… (More)


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Citations per Year

Citation Velocity: 14

Averaging 14 citations per year over the last 3 years.

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