Properties of self-assembled ZnO nanostructures on Si and SiO/sub 2/ wafers

@article{Ali2001PropertiesOS,
  title={Properties of self-assembled ZnO nanostructures on Si and SiO/sub 2/ wafers},
  author={H. A. Ali and A. A. Iliadis and Arthur von Cresce and Peter Kofinas and U. Lee},
  journal={2001 International Semiconductor Device Research Symposium. Symposium Proceedings (Cat. No.01EX497)},
  year={2001},
  pages={454-457}
}
The formation of self-assembled ZnO nanoclusters on Si and SiO/sub 2//Si surfaces, using diblock copolymers and wet chemical processing compatible with semiconductor manufacturing, is reported. The diblock copolymers, consisting of a majority polymer (norbornene) and a minority polymer (norbornene-dicarboxcylic acid), were synthesized with a block repeat unit ratio of 400 (majority block) to 50 (minority block), to obtain spherical microphase separation for the minority block and hence a… CONTINUE READING