Properties of amorphous carbon – silicon alloys deposited by a high plasma density source

@inproceedings{Racine2001PropertiesOA,
  title={Properties of amorphous carbon – silicon alloys deposited by a high plasma density source},
  author={B P Racine and Andrea C. Ferrari and N. A. Morrison and Ian M. Hutchings and W. I. Milne and John Robertson},
  year={2001}
}
The addition of silicon to hydrogenated amorphous carbon can have the advantageous effect of lowering the compressive stress, improving the thermal stability of its hydrogen, and maintaining a low friction coefficient up to high humidity. Most experiments to date have been on hydrogenated amorphous carbon–silicon alloys ( a-C12xSix :H) deposited by rf plasma enhanced chemical vapor deposition. This method gives alloys with sizeable hydrogen content and only moderate hardness. Here we use a high… CONTINUE READING

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