Properties of ZnO Õ Al 2 O 3 Alloy Films Grown Using Atomic Layer Deposition Techniques , epeating

@inproceedings{Elam2003PropertiesOZ,
  title={Properties of ZnO {\~O} Al 2 O 3 Alloy Films Grown Using Atomic Layer Deposition Techniques , epeating},
  author={Jeffrey W Elam and D. Routkevitchb and S. M. Georgea},
  year={2003}
}
By varying the ratio of the constituents, compound films can exhibit a widely tunable range of physical properties. Atomic layer deposition~ALD ! techniques are based on sequential, self-limiting surface reactions and can grow compound films. In this study ZnO/Al2O3 alloy films were prepared using ALD techniques. By adjusting the ALD pulse sequence, the ZnO/Al 2O3 alloy film composition was varied from 0-100% ZnO. These ZnO/Al 2O3 alloy films are expected to display varying properties because… CONTINUE READING
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