Progress toward realization of the digital electrostatic e-beam array lithography (DEAL) concept

Abstract

Prototype field emission devices have been fabricated in the 300-1000 eV range using vertically aligned carbon nanofibers as the field emitter. The devices are fabricated using a self-aligned process for the extraction gate opening and the focus grid opening is defined lithographically. Field emission tests of the completed devices are carried out in a… (More)

3 Figures and Tables

Cite this paper

@article{Baylor2005ProgressTR, title={Progress toward realization of the digital electrostatic e-beam array lithography (DEAL) concept}, author={L. R. Baylor and W Kelley Gardner and Xieshen Yang and R. J. Kasica and B. Blalock and C. Durisety and J. Fowlkes and D. K. Hensley and S. K. Islam and D Joy and A. V. Melechko and P Rack and S. J. Randolph and Randy Rucker and D. M. Thomas and M. Simpson}, journal={2005 International Vacuum Nanoelectronics Conference}, year={2005}, pages={74-75} }