Progress on Xe-DPP source development for alpha phase

  title={Progress on Xe-DPP source development for alpha phase},
  author={Masaki Yoshioka and Denis Bolshukhin and Guido Hergenhan and Juergen Kleinschmidt and Vladimir Korobochko and Guido Schriever and Max C. Schuermann and C. Tran and C. H. Ziener},
  booktitle={SPIE Advanced Lithography},
EUVL source development at XTREME technologies benefits from the learning gained in previous developments for EUV Micro Exposure and Alpha Tools. Field data available from operation of these tools represent the basis for continuous improvement in core technology areas such as plasma generation and forming, component reliability, debris mitigation and optical performance. Results from integration and first operation of alpha tool sources are presented in the areas power performance… CONTINUE READING


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A. Brunton, J. S. Cashmore, +12 authors M. D. Whitfield
  • Proc. SPIE 5751 no
  • 2005