Progress, Opportunities and Challenges in Modeling of Plasma Etching

@article{Yang2008ProgressOA,
  title={Progress, Opportunities and Challenges in Modeling of Plasma Etching},
  author={Yang Yang and Mingmei Wang and Mark J. Kushner},
  journal={2008 International Interconnect Technology Conference},
  year={2008},
  pages={90-92}
}
The development of plasma etching processes is challenged by the complexity of the chemistries and the unpredictability in the performance of plasma tools due to sometimes subtle changes in design. Challenges also face the use of modeling and simulation to provide a computational assist to the development of these processes. Selected issues in developing this modeling capability will be discussed. 
Highly Cited
This paper has 21 citations. REVIEW CITATIONS