Programmable Lithography Engine, Prole™, Grid-type Supercomputer and Its Applications Semiconductor Design Costs Are Skyrocketing, from Approximately $0.5m at 350nm Feature Size and $5m at 180nm, to $50m at 90nm for Complex Designs

Abstract

There are many variables that can affect lithographic dependent device yield. Because of this, it is not enough to make optical proximity corrections (OPC) based on the mask type, wavelength, lens, illumination-type and coherence. Resist chemistry and physics along with substrate, exposure, and all post-exposure processing must be considered too. Only a… (More)

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