Production of separation-nozzle systems for uranium enrichment by a combination of X-ray lithography and galvanoplastics

@article{Backer2004ProductionOS,
  title={Production of separation-nozzle systems for uranium enrichment by a combination of X-ray lithography and galvanoplastics},
  author={E. Backer and W. Ehrfeld and D. M{\"u}nchmeyer and H. Betz and A. Heuberger and S. Pongratz and W. Glashauser and H. Michel and R. Siemens},
  journal={Naturwissenschaften},
  year={2004},
  volume={69},
  pages={520-523}
}
X-ray lithography using synchrotron radiation has been applied in a multi-step process for the production of plastic moulds to be used in the fabrication of separation nozzles by electrodeposition. [...] Key Result For characteristic dimensions of a few microns a total height of the nozzle structure of about 400 μm has been achieved. Structural details of about 0.1 μm are being reproduced across the total thickness of the polymer layer.Expand

Figures from this paper

X-ray Lithography Techniques, LIGA-Based Microsystem Manufacturing: The Electrochemistry of Through-Mold Deposition and Material Properties
Certain microsystem fabrication techniques are critically dependent on the electrochemistry of metal deposition into lithographically defined features that are developed in insulating moldingExpand
Fabrication of High-aspect-ratio Microstructures for LIGA-technology by Sinchrotron Radiation Polymerisation of Thetetraacrylate Monomer☆
Abstract The high-aspect ratio microstructures were fabricated by action of synchrotron x-ray on the synthesized tetraacrylate monomer:Expand
High-resolution x-ray masks for high aspect ratio microelectromechanical systems applications
The advanced requirements of bio-MEMS and MOEMS, i.e., low sidewall surface roughness, submicron critical dimension, and high aspect ratio, necessitate the use of an intermediate mask and a softExpand
SYNCHROTRON-RADIATION-SUPPORTED HIGH-ASPECT-RATIO NANOFABRICATION
X-ray lithography with synchrotron radiation is an important nanolithographic tool which has unique advantages in the production of high aspect ratio nanostructures. The optimum synchrotron radiationExpand
A simple method for microlens fabrication by the modified LIGA process
Microlenses and microlens arrays were fabricated using a novel fabrication technology based on the exposure of a resist (usually PMMA) to deep x-rays and subsequent thermal treatment. The fabricationExpand
Deep X-ray lithography processing for batch fabrication of thick polymer-based antenna structures
Deep x-ray lithography is applied for the first time to fabricate polymer-based antenna structures with different portions of ceramic contents. To produce successful and viable antenna structures,Expand
Microlens fabrication by the modified LIGA process
  • Sung-Keun Lee, Kwang-Cheol Lee, S.S. Lee
  • Materials Science
  • Technical Digest. MEMS 2002 IEEE International Conference. Fifteenth IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.02CH37266)
  • 2002
A microlens or microlenses array has been fabricated by a novel fabrication technology which is based upon a deep X-ray exposure and a thermal treatment of a resist, usually PMMA. The fabricationExpand
Improvement of current distribution uniformity on substrates for microelectromechanical systems
The employment of an insulating shield for the improvement of the current distribution on 3-in. wafer substrates is considered. Numerical analysis is used to evaluate the influence of shield shapeExpand
Embossing of microscale features in Pb and Zn
Embossing of microscale features into Pb and Zn was carried out using LIGA (Lithographie, Galvanoformung, Abformung) fabricated Ni mold inserts with features 100 microns in diameter and 500 micronsExpand
Experimental Study of the Microstructure and Stress of Electroplated Gold for Microsystem Applications
Gold, used as an X-ray absorber for lithography and as a structural or conducting material in microsystems, was deposited from a commercially available sulfite electrolyte. The effects of currentExpand
...
1
2
3
4
5
...

References

SHOWING 1-8 OF 8 REFERENCES
Uranium Enrichment by the Separation Nozzle Method Within the Framework of German/Brazilian Cooperation
In the separation nozzle process, the enrichment of /sup 235/U is achieved by extremely high centrifugal forces in a curved flow of UF/sub 6/ diluted by a light gas. Remarkable progress has been madeExpand
Uranium enrichment by the separation-nozzle process
TLDR
It can be stated that the erection of a separation-nozzle demonstration plant in Brazil can be recognized as the implementation of an enrichment process which combines a reliable and comparatively simple technology with a high potential for further improvements. Expand
High resolution, steep profile, resist patterns
High resolution and steep profile patterns have been generated in a 2.6-μm thick organic layer which conforms to the steps on a wafer surface and is planar on its top. This thick organic layer (aExpand
X–Ray Optics – Applications to Solids
H J Quiesser (ed) 1977 Berlin : Springer x + 227 pp price S35 Over the past two decades, the laser has been the dominant development in the field of optics and scant publicity has been accorded toExpand
"J."
however (for it was the literal soul of the life of the Redeemer, John xv. io), is the peculiar token of fellowship with the Redeemer. That love to God (what is meant here is not God’s love to men)Expand
Nucl
  • Technol. 52, 105
  • 1981
Development and technical implementation of the separation nozzle process for enrichment of uranium 235
In the separation nozzle process, enrichment is achieved by extremely high centrifugal forces in a curved flow of UF/sub 6/ diluted by a light gas. The first commercial application is in Brasil,Expand
X-ray optics : applications to solids