Production of Thin Oxide Films by Sputtering in A Ring Discharge

@inproceedings{Hecq1974ProductionOT,
  title={Production of Thin Oxide Films by Sputtering in A Ring Discharge},
  author={Michel. Hecq and Jean Van Prof Cakenberghe},
  year={1974}
}
Very high deposition rates are obtained in a system based on the erosion of cavities into which an induced discharge is maintained. Applications to refractory and mixed oxides are described. A sputtering mechanism is suggested. 

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