Preventing Lithography-Induced Maverick Yield Events With A Dispense System Advanced Equipment Control Method

@article{Braggin2008PreventingLM,
  title={Preventing Lithography-Induced Maverick Yield Events With A Dispense System Advanced Equipment Control Method},
  author={Jennifer Braggin},
  journal={2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference},
  year={2008},
  pages={31-36}
}
As semiconductor manufacturers march to the drum beat of Moore's law there is very little room for yield mavericks, especially those that can be prevented. Critical process errors are costly and photolithography is one of the few processes in semiconductor manufacturing where there is an opportunity to correct errors. Small changes in photo resist dispensed… CONTINUE READING