Preparation of hydrogenated amorphous germanium nitrogen alloys by plasma enhanced chemical vapor deposition

@inproceedings{Xu1996PreparationOH,
  title={Preparation of hydrogenated amorphous germanium nitrogen alloys by plasma enhanced chemical vapor deposition},
  author={Jun Xu and Kaixuan Chen and Duan Feng and Seiichi Miyazaki and Masataka Hirose},
  year={1996}
}
A series of hydrogenated amorphous germanium nitrogen alloys have been prepared by using plasma enhanced chemical vapor deposition system. The structure, optical and electrical properties have been investigated and compared with the samples produced by reactive sputtering method. It is found that inclusion of nitrogen into a‐Ge:H network increases the structural stability and induces the significant changes both in optical and electrical properties. Hydrogenated a‐GeN films have also been… CONTINUE READING

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