Precise and fast secondary ion mass spectrometry depth profiling of polymer materials with large Ar cluster ion beams.

@article{Ninomiya2009PreciseAF,
  title={Precise and fast secondary ion mass spectrometry depth profiling of polymer materials with large Ar cluster ion beams.},
  author={Satoshi Ninomiya and Kazuya Ichiki and Hideaki Yamada and Yoshihiko Nakata and Toshio Seki and Takaaki Aoki and Jiro Matsuo},
  journal={Rapid communications in mass spectrometry : RCM},
  year={2009},
  volume={23 11},
  pages={
          1601-6
        }
}
We demonstrate depth profiling of polymer materials by using large argon (Ar) cluster ion beams. In general, depth profiling with secondary ion mass spectrometry (SIMS) presents serious problems in organic materials, because the primary keV atomic ion beams often damage them and the molecular ion yields decrease with increasing incident ion fluence. Recently, we have found reduced damage of organic materials during sputtering with large gas cluster ions, and reported on the unique secondary ion… CONTINUE READING

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