Plasmonic Nanolithography: A Review

  title={Plasmonic Nanolithography: A Review},
  author={Zhihua Xie and Weixing Yu and Taisheng Wang and Hongxin Zhang and Yongqi Fu and Hua Liu and Fengyou Li and Zhenwu Lu and Qiang Sun},
Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact… 
Plasmonic nanolithography (PNL) is a surface plasmons (SPs)-based high resolution nanolithography technology. It has attracted great interests for its capability of forming sub-diffraction-limit
Two-surface-plasmon-polariton-absorption based nanolithography
We propose and demonstrate the two-surface-plasmon-polariton-absorption (TSPPA), which is a nonlinear effect by absorbing two surface-plasmon-polaritons (SPPs), as well as a nanolithography technique
Oblique angle deposition and its applications in plasmonics
Plasmonics based on localized surface plasmon resonance (LSPR) has found many exciting applications recently. Those applications usually require a good morphological and structural control of
In this work the "central" surface plasmon-polariton was obtained by using frequency dependent difference time-domain method for the TM- polarized light at 532 nm, which was propagating through the
Nanolithography based on two-surface-plasmon-polariton-absorption
Nanolithography utilizing the nonlinear absorption of two surface plasmon polaritons in resists has been demonstrated. The linewidth of ~λ0/11 are achieved by illuminating the plasmonic mask with the
Deep Plasmonic Direct Writing Lithography with ENZ Metamaterials and Nanoantenna.
A specially designed resonant metamaterial with epsilon-near-zero (ENZ) and nanoantenna is demonstrated to enhance the exposure depth in plasmonic direct writing lithography more than 10 times.
Surface-plasmon-polaritons-assisted nanolithography with dual-wavelength illumination for high exposure depth.
A new direct writing nanolithography approach using a plasmonic focusing device and a nano silver mirror with dual-wavelength illumination for high exposure depth and results show a space of 44 nm at the bottom of the photoresist could be obtained after exposure and development.
Performance analyses of plasmonic lithography
We analyzed the field contrast, aspect ratio, pattern uniformity as well as the line-edge roughness (LER) of the patterns fabricated in plasmonic lithography. Deep subwavelength patterns with high
Single-molecule Imaging of Metallic Nanostructures on a Plasmonic Metal Grating Superlens
A plasmonic grating substrate is presented that extends light microscope image resolution in both fluorescence and brightfield modes and enhanced spatial resolution was demonstrated by distinguishing between triangular nanoprisms and cubic nanocages with an epifluorescence microscope without the need for mathematical reconstruction.
40  nm thick photoresist-compatible plasmonic nanolithography using a bowtie aperture combined with a metal-insulator-metal structure.
In this Letter, 40 nm thick photoresist (PR)-compatible plasmonic nanolithography using a bowtie aperture incorporated with a metal-insulator-metal (MIM) structure is studied numerically and experimentally and the ability to generate high-resolution, complex patterns via scanning is demonstrated.


Nanogap-Assisted Surface Plasmon Nanolithography
Nanoparticles of noble metals exhibit localized surface plasmons (LSP) associated with enhancement of the electromagnetic field due to its localization in nanometric domains at the surface of
193nm interference nanolithography based on SPP
Large-area surface plasmon polariton interference lithography (LSPPIL) is a promising nano-fabrication technique for making periodic nano-patterns. In this paper, for reducing further the feature
Plasmonic properties of film over nanowell surfaces fabricated by nanosphere lithography.
In this work, a detailed and systematic study of the plasmonic properties of a novel film over nanowell surface is investigated, resulting in an improvement in the figure of merit.
Sub-100 nm lithography using ultrashort wavelength of surface plasmons
The development of a nanolithography technique utilizing ultrashort wavelength of surface plasmons (SPs) is presented in this article. The mask consists of silver thin film perforated with
Flying plasmonic lens at near field for high speed nanolithography
Optical lithography has been the key for continuous size reduction of semiconductor devices and circuits manufacturing. Although the industry is continually improving the resolution, optical
A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique.
A backside-exposure technique is introduced that can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid.
Deep subwavelength nanolithography using localized surface plasmon modes on planar silver mask
The development of a near-field optical lithography is presented in this paper. By accessing short modal wavelengths of localized surface plasmon modes on a planar metallic mask, the resolution can
Flying plasmonic lens in the near field for high-speed nanolithography.
A new low-cost, high-throughput approach to maskless nanolithography that uses an array of plasmonic lenses that 'flies' above the surface to be patterned, concentrating short-wavelength surface plasmons into sub-100 nm spots.
Nanoscale photolithography by means of surface plasmon interference
We discuss a technique for obtaining surface plasmon interference patterns, which may find use in photolithography. To obtain the interference patterns we propose that a diffraction grating with a
Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film.
A photolithographic method to fabricate nanostructures by employing a localized surface plasmon (LSP) mask generated by a soft mold on a thin metal film, providing a modulated optical field in the resist with nanometer feature size is proposed.