Plasmonic Nanolithography: A Review

@article{Xie2011PlasmonicNA,
  title={Plasmonic Nanolithography: A Review},
  author={Zhihua Xie and Weixing Yu and Taisheng Wang and Hongxin Zhang and Yongqi Fu and Hua Liu and Fengyou Li and Zhenwu Lu and Qiang Sun},
  journal={Plasmonics},
  year={2011},
  volume={6},
  pages={565-580}
}
Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact… 
PLASMONIC NANOLITHOGRAPHY: TOWARDS NEXT GENERATION NANOPATTERNING
Plasmonic nanolithography (PNL) is a surface plasmons (SPs)-based high resolution nanolithography technology. It has attracted great interests for its capability of forming sub-diffraction-limit
Two-surface-plasmon-polariton-absorption based nanolithography
We propose and demonstrate the two-surface-plasmon-polariton-absorption (TSPPA), which is a nonlinear effect by absorbing two surface-plasmon-polaritons (SPPs), as well as a nanolithography technique
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Plasmonics based on localized surface plasmon resonance (LSPR) has found many exciting applications recently. Those applications usually require a good morphological and structural control of
FORMATION OF PLASMONIC NANOJETS BY SILVER NANO-STRIP
In this work the "central" surface plasmon-polariton was obtained by using frequency dependent difference time-domain method for the TM- polarized light at 532 nm, which was propagating through the
Nanolithography based on two-surface-plasmon-polariton-absorption
Nanolithography utilizing the nonlinear absorption of two surface plasmon polaritons in resists has been demonstrated. The linewidth of ~λ0/11 are achieved by illuminating the plasmonic mask with the
Deep Plasmonic Direct Writing Lithography with ENZ Metamaterials and Nanoantenna.
TLDR
A specially designed resonant metamaterial with epsilon-near-zero (ENZ) and nanoantenna is demonstrated to enhance the exposure depth in plasmonic direct writing lithography more than 10 times.
Surface-plasmon-polaritons-assisted nanolithography with dual-wavelength illumination for high exposure depth.
TLDR
A new direct writing nanolithography approach using a plasmonic focusing device and a nano silver mirror with dual-wavelength illumination for high exposure depth and results show a space of 44 nm at the bottom of the photoresist could be obtained after exposure and development.
Performance analyses of plasmonic lithography
We analyzed the field contrast, aspect ratio, pattern uniformity as well as the line-edge roughness (LER) of the patterns fabricated in plasmonic lithography. Deep subwavelength patterns with high
Single-molecule Imaging of Metallic Nanostructures on a Plasmonic Metal Grating Superlens
TLDR
A plasmonic grating substrate is presented that extends light microscope image resolution in both fluorescence and brightfield modes and enhanced spatial resolution was demonstrated by distinguishing between triangular nanoprisms and cubic nanocages with an epifluorescence microscope without the need for mathematical reconstruction.
40  nm thick photoresist-compatible plasmonic nanolithography using a bowtie aperture combined with a metal-insulator-metal structure.
TLDR
In this Letter, 40 nm thick photoresist (PR)-compatible plasmonic nanolithography using a bowtie aperture incorporated with a metal-insulator-metal (MIM) structure is studied numerically and experimentally and the ability to generate high-resolution, complex patterns via scanning is demonstrated.
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