Plasma etching of proton-exchanged lithium niobate

@inproceedings{Hu2006PlasmaEO,
  title={Plasma etching of proton-exchanged lithium niobate},
  author={Hui Hu and Alexey P. Milenin and Ralf B. Wehrspohn and Helmut Hermann and Wolfgang Sohler},
  year={2006}
}
Plasma etching of lithium niobate with fluorine gases is limited by the redeposition LiF. This results in a low etch rate and nonvertically etched walls. Etching of proton-exchanged lithium niobate can prevent the LiF deposition to a large extent because of the greatly reduced lithium concentration in lithium niobate. We performed different inductively coupled plasma etching processes using SF6 or CHF3/Ar on proton-exchanged lithium niobate. Negligible underetching and nearly vertically etched… CONTINUE READING

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