Plasma etching: Yesterday, today, and tomorrow

@article{Donnelly2013PlasmaEY,
  title={Plasma etching: Yesterday, today, and tomorrow},
  author={Vincent M. Donnelly and Avinoam Kornblit},
  journal={Journal of Vacuum Science and Technology},
  year={2013},
  volume={31},
  pages={050825}
}
The field of plasma etching is reviewed. Plasma etching, a revolutionary extension of the technique of physical sputtering, was introduced to integrated circuit manufacturing as early as the mid 1960s and more widely in the early 1970s, in an effort to reduce liquid waste disposal in manufacturing and achieve selectivities that were difficult to obtain with wet chemistry. Quickly, the ability to anisotropically etch silicon, aluminum, and silicon dioxide in plasmas became the breakthrough that… 
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