Analog Characteristics of MetalInsulator-Metal Capacitors Using PECVD Nitride Dielectrics
- Babcock, Balster
- EDL VOL. 22,
Impact on MIM capacitor reliability with respect to plasma damage is investigated for different dielectric films and layout variations. MIM capacitor reliability is found to be sensitive to dielectric type, MIM layout and bottom plate metal processing. Plasma Process steps responsible for affecting MIM reliability are identified.