Plasma damage considerations involving metal-insulator-metal (MIM) capacitors

Abstract

Impact on MIM capacitor reliability with respect to plasma damage is investigated for different dielectric films and layout variations. MIM capacitor reliability is found to be sensitive to dielectric type, MIM layout and bottom plate metal processing. Plasma Process steps responsible for affecting MIM reliability are identified.

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Cite this paper

@article{OConnell2004PlasmaDC, title={Plasma damage considerations involving metal-insulator-metal (MIM) capacitors}, author={Barry O'Connell and T. Thibeault and Prasad Chaparala}, journal={2004 International Conference on Integrated Circuit Design and Technology (IEEE Cat. No.04EX866)}, year={2004}, pages={123-126} }