Plasma Jet-Substrate Interaction in Low Pressure Plasma Spray-CVD Processes

  title={Plasma Jet-Substrate Interaction in Low Pressure Plasma Spray-CVD Processes},
  author={Ph. Guittienne and D. La Grange and Ch. Hollenstein and Malko Gindrat},
  journal={Journal of Thermal Spray Technology},
Conventional equipment for plasma spraying can be adapted for operation at low pressure so that PECVD-like processing can be performed. The plasma jet generated by the torch is characterized by a high convective velocity and a high gas temperature. The influence of these properties on a deposition process are investigated in the framework of simple theoretical considerations and illustrated by various experimental results obtained with SiOx deposition. A conclusion of this study is that the… Expand
5 Citations
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  • Hollenstein, M. Gindrat, and A. Refke, Mechanisms of Films and Coatings Formation from Gaseous and Liquid Precursors with Low Pressure Plasma Spray Equipment, Surf. Coat. Technol.,
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and C
  • Hollenstein, Characterization of LPPS Processes Under Various Spray Conditions for Potential Applications, Thermal Spray 2003: Advancing the Science and Applying the Technology, International Thermal Spray Conference 2003, B.R. Marple and C. Moreau, Ed., 5-8 May 2003 (Orlando, CA, USA), ASM Internat
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