Planar Ion Trap Geometry for Microfabrication

@inproceedings{Madsen2004PlanarIT,
  title={Planar Ion Trap Geometry for Microfabrication},
  author={M. J. Madsen and Winfried K. Hensinger and Daniel Stick and James Rabchuk and Christopher A. Monroe},
  year={2004}
}
We describe a novel high aspect ratio radiofrequency linear ion trap geometry that is amenable to modern microfabrication techniques. The ion trap electrode structure consists of a pair of stacked conducting cantilevers resulting in confining fields that take the form of fringe fields from parallel plate capacitors. The confining potentials are modeled both analytically and numerically. This ion trap geometry may form the basis for large scale quantum computers or parallel quadrupole mass… CONTINUE READING
Highly Cited
This paper has 58 citations. REVIEW CITATIONS

17 Figures & Tables

Topics

Statistics

0510'05'07'09'11'13'15'17
Citations per Year

58 Citations

Semantic Scholar estimates that this publication has 58 citations based on the available data.

See our FAQ for additional information.