Pigment-dispersed color resist with high resolution for advanced color filter application

@article{Lee1999PigmentdispersedCR,
  title={Pigment-dispersed color resist with high resolution for advanced color filter application},
  author={Rong-Jer Lee and Jr-Cheng Fan and Tzong-Shing Cheng and Jung-Lung Wu},
  journal={Proceedings of 5th Asian Symposium on Information Display. ASID '99 (IEEE Cat. No.99EX291)},
  year={1999},
  pages={359-363}
}
  • Rong-Jer Lee, Jr-Cheng Fan, +1 author Jung-Lung Wu
  • Published 19 March 1999
  • Materials Science
  • Proceedings of 5th Asian Symposium on Information Display. ASID '99 (IEEE Cat. No.99EX291)
A positive working pigment-dispersed color resist comprising organic pigments and a chemically amplified resist system is designed for a high resolution color filter with fine patterns of less than 5 /spl mu/m lines and spaces. It also shows high brightness and good color reproducibility. An acrylic binder including an acid labile group and an aromatic function group that have both functions of acid catalysed unblocking and good compatibility with pigments is also synthesized. 

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