Physical Properties of HWCVD Microcrystalline Silicon Thin Films: Preprint

Abstract

Microcrystalline silicon films were grown with different thicknesses and different hydrogen dilution ratios on glass and Si substrates. Some films were deposited with a seed layer, whereas others were deposited directly on the substrate. We used atomic force microscopy, scanning electron microscopy, and X-ray diffraction to study the morphology and… (More)

Topics

5 Figures and Tables

Slides referencing similar topics