Photoresist materials: a historical perspective

@inproceedings{Willson1997PhotoresistMA,
  title={Photoresist materials: a historical perspective},
  author={Carlton Grant Willson and Ralph R. Dammel and Arnost. Reiser},
  booktitle={Advanced Lithography},
  year={1997}
}
This paper provides a short history of the development of resist materials. We trace the development of resists from the very beginnings of photography in the early 1800s to today's efforts to develop 193 nm resist materials. 
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