Photoresist materials: a historical perspective

@inproceedings{Willson1997PhotoresistMA,
  title={Photoresist materials: a historical perspective},
  author={C. Willson and R. Dammel and A. Reiser},
  booktitle={Advanced Lithography},
  year={1997}
}
This paper provides a short history of the development of resist materials. We trace the development of resists from the very beginnings of photography in the early 1800s to today's efforts to develop 193 nm resist materials. 
Alternative resist approaches
Photoresists for microlithography
Spin coating and photolithography using liquid and supercritical carbon dioxide
Nodal Photolithography: Lithography via Far-Field Optical Nodes in the Resist
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References

SHOWING 1-7 OF 7 REFERENCES
Krongauz and A.D. Trifunac
  • 1995
Dammel, Diazonaphthoquinone-based Resists
  • Semiconductor Lithography. Principles. Practices. and Materials. Plenum Press: New York,
  • 1993
DeForest, Photoresists: Materials and Processes
  • 1975
Gemsheim, The Photographic Journal
  • Section A. I
  • 1952