Photolabile and thermally labile polymers as templates and for surface patterning

@article{Voit2006PhotolabileAT,
  title={Photolabile and thermally labile polymers as templates and for surface patterning},
  author={B. Voit and F. Braun and M. Gernert and B. Sieczkowska and M. Millaruelo and M. Messerschmidt and M. Mertig and J. Opitz},
  journal={Polymers for Advanced Technologies},
  year={2006},
  volume={17},
  pages={691-693}
}
The successful selective metal deposition using a photolabile polymer consisting of a diazosulfonate side chain group has been reported. In addition to 20 mol% diazosulfonate monomer the terpolymer contains 5 mol% of a silane compound, which is necessary for the covalent anchoring of the film onto the substrate. Furthermore, films were prepared using photolabile polymers containing protected amines onto glass and silicon substrates. These films are suitable for imagewise structuring by UV-light… Expand
5 Citations