Phase control in multiexposure spatial frequency multiplication

  title={Phase control in multiexposure spatial frequency multiplication},
  author={Y. Zhao and Chih-Hao Chang and R. Heilmann and M. Schattenburg},
  journal={Journal of Vacuum Science \& Technology B},
Multiexposure spatial frequency multiplication is a technique that allows the spatial frequency of grating patterns to be increased by integer factors 2,3,4,… by applying a nonlinear development process between patterning steps. One of the main technical issues with this technique is how to accurately place subsequent patterns on a substrate with respect to previously established patterns, which is referred to as phase control of the overlay. The authors report a technique that achieves… Expand
Spatial-frequency multiplication with multilevel interference lithography
The authors present a large-area spatial-frequency multiplication fabrication process for patterning one-dimensional periodic structures using multilevel interference lithography. In this process,Expand
Multilevel interference lithography--fabricating sub-wavelength periodic nanostructures
Periodic nanostructures have many exciting applications, including high-energy spectroscopy, patterned magnetic media, photonic crystals, and templates for self-assembly. Interference lithographyExpand
Fabrication of 50 nm period gratings with multilevel interference lithography.
A multilevel interference lithography process to fabricate 50 nm period gratings using light with a 351.1 nm wavelength that presents a general scheme for overlaying periodic structures and can be used to Fabricate more complex periodic structures. Expand
Oscillating Holograms Recorded In Photorefractive Crystals By A Frequency Detuned Feedback Loop
We report an optoelectronic feedback loop suitable for generating noise-free interference patterns oscillating at arbitrary waveforms. The technique allows controlling the frequency detuning betweenExpand
Evaluation of three exposure schemes for absorbance-modulated interference lithography
Using absorbance-modulated interference lithography (AMIL), subdiffraction-limited gratings can be patterned using a variety of configurations. Three main configurations are compared here usingExpand
Manipulating spatial light fields for micro- and nano-photonics
Abstract Spatial properties of a light field, including its amplitude, polarization and phase distribution, can be modulated via spatial light modulators, digital mirror devices, optical mask,Expand
Molecules as segmented storage elements in Floating Gate Memories
Conventional flash memories may reach fundamental scaling limits [1] because of the minimum tunnel oxide thickness and poor charge retention due to defects in the tunneling oxide, necessitating newExpand


Phase-locking of superimposed diffractive gratings in photoresists
Abstract The superposition of optical interference patterns in a photoresist film can produce a rich variety of diffractive structures. In particular, a periodic non-sinusoidal surface relief profileExpand
Nonlinear processes to extend interferometric lithography
The linear-systems spatial frequency limit of diffraction- limited optical lithography is approximately NA/(lambda) , where NA is the optical system numerical aperture, and (lambda) is the exposureExpand
Spatial period division—A new technique for exposing submicrometer‐linewidth periodic and quasiperiodic patterns
We describe a technique for exposing patterns of spatial period p/n using near‐field diffraction from masks of spatial period p. The technique, which we propose to call ’’spatial‐period‐division’’,Expand
Digital heterodyne interference fringe control system
In traditional interference lithography, interference fringes are typically phase locked to a stationary substrate using analog homodyne photodiode signals that are fed back to control aExpand
Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications
In this article we report on the fabrication of 100 nm pitch gratings over a large area (∼10 cm2) using a simple, low-cost, fast process. This method includes (1) generation of the grating patternExpand
Optical and Interferometric Lithography - Nanotechnology Enablers
  • S. Brueck
  • Computer Science, Materials Science
  • Proceedings of the IEEE
  • 2005
Interferometric lithography (IL), the interference of a small number of coherent optical beams, is a powerful technique for the fabrication of a wide array of samples of interest for nanoscience andExpand
Large area 50nm period grating by multiple nanoimprint lithography and spatial frequency doubling
The authors have developed an approach to fabricate large area 50nm period gratings (22nm linewidth) with low cost. The method used a fabrication cycle twice, each combining nanoimprint lithographyExpand
Beam alignment and image metrology for scanning beam interference lithography: fabricating gratings with nanometer phase accuracy
SBIL is capable of producing gratings with subnanometer phase nonlinearities, according to the point of view of period control and wavefront metrology, and this thesis work concludes that SBIL has the potential to produce large-area linear diffraction gratings that are phase-accurate to the nanometer level. Expand
Deep-ultraviolet spatial-period division using an excimer laser.
We have used the deep-UV output from an ArF laser and a grating mask with 199-nm spatial period to fabricate a 99.5-nm-period grating pattern in polymethyl methacrylate resist by spatial-periodExpand
Design and analysis of a scanning beam interference lithography system for patterning gratings with nanometer-level distortions
This thesis describes the design and analysis of a system for patterning large-area gratings with nanometer level phase distortions. The novel patterning method, termed scanning beam interferenceExpand