Perflourosulfonyl imides and methides: investigating the lithographic potential of novel superacid PAGs

@inproceedings{Lee2002PerflourosulfonylIA,
  title={Perflourosulfonyl imides and methides: investigating the lithographic potential of novel superacid PAGs},
  author={Dongkwan Lee and Xiaoming Ma and William M. Lamanna and Georg Pawlowski},
  booktitle={SPIE Advanced Lithography},
  year={2002}
}
The lithographic performance of a new class of onium type photo acid generators (PAGs) developed by 3M Company has been evaluated using standard hybrid/acetal and ESCAP type DUV (248 nm) photoresist formulations. The new PAGs produce perfluoroalkyl sulfonylimides or sulfonylmethides with superacidic properties matching or exceeding the acid strength of commonly known perfluoroalkyl sulfonic acids, such as trifluoromethane sulfonic acid. The direct comparison of near commercial photoresist… CONTINUE READING