Patterning of the Self-Assembled Monolayer Using the Zero Residual Nano-Imprint Lithography

@inproceedings{Yang2007PatterningOT,
  title={Patterning of the Self-Assembled Monolayer Using the Zero Residual Nano-Imprint Lithography},
  author={Ki Yeon Yang and J Kim and Sung Hoon Hong and Heon Lee},
  year={2007}
}
Self-Assembled Monolayer (SAM) is a single layer of ordered molecules absorbed on a surface by chemical bonding between the molecular head group and the surface. The surface properties can be controlled by the terminal functional group of the SAM layer. In order to utilize SAM layers for device applications, SAM layer needs to be patterned as a sub-micron size. Patterning of SAM layer in sub-micron size has been done by various techniques including direct-writing by dip-pen nano lithography… CONTINUE READING