Pattern formation in drying water films

@inproceedings{Lipson1996PatternFI,
  title={Pattern formation in drying water films},
  author={Steven G. Lipson},
  year={1996}
}
A thick water film is deposited on a mica substrate, which it wets, from pure water vapour at a low temperature. The vapour pressure is reduced so that the water evaporates. Despite the fact that under equilibrium conditions the film wets the substrate, when it reaches a thickness of about 500 A, dry patches nucleate in the film and the water recedes to the wet parts. During the recession, a thick rim of water is created, which becomes hydrodynamically unstable and produces a beautiful… CONTINUE READING